Location History:
- Wallingford, CT (US) (1986)
- Fairfield, CT (US) (1999)
- Trumbull, CT (US) (1990 - 2024)
Company Filing History:
Years Active: 1986-2025
Title: Joseph J. Kozakiewicz: Innovator in Polymer Stabilization
Introduction
Joseph J. Kozakiewicz is a prominent inventor based in Trumbull, CT, with an impressive portfolio of 32 patents. His work primarily focuses on enhancing the durability of polymeric organic materials through innovative stabilizer compositions.
Latest Patents
Kozakiewicz's latest patents revolve around stabilizer compositions designed to protect polymeric organic materials from ultraviolet (UV) light and thermal degradation. One notable patent discusses a stabilizer composition featuring at least one co-active agent, an ultraviolet light absorber derived from orthohydroxyphenyl triazine compounds and/or benzoxazinone compounds, alongside a hindered amine light stabilizer. Another recent patent details similar stabilizer compositions, utilizing an ultraviolet light absorber chosen from ortho-hydroxy benzophenone and/or ortho-hydroxyphenyl benzotriazole, which can also be used alongside masterbatch concentrates to significantly enhance the stability of these materials against UV and thermal deterioration.
Career Highlights
Throughout his career, Kozakiewicz has collaborated with notable organizations, including Cytec Technology Corporation and American Cyanamid Company. His innovative contributions have significantly advanced the field of polymer stabilization, making a lasting impact on industries that rely on durable polymeric materials.
Collaborations
Kozakiewicz has worked alongside esteemed colleagues such as Sun-Yi Huang and Louis Rosati, fostering a collaborative environment that has propelled advancements in chemical engineering and material science. These collaborations have contributed to his success in developing effective stabilizer methods.
Conclusion
Joseph J. Kozakiewicz stands out as a leading inventor in the field of polymer stabilization. His innovative patents and career developments highlight his dedication to enhancing the durability of polymeric materials against environmental factors. His work not only showcases his inventive talent but also contributes to the progress of material protection technologies.