Joseph E Whetsel

Title: Joseph E Whetsel: Innovator in Plasma Reactor Technology

Introduction

Joseph E Whetsel is a notable inventor based in Richardson, Texas. He has made significant contributions to the field of plasma technology, particularly in the design of plasma etch electrodes. His innovative work has implications for the semiconductor industry, enhancing the efficiency and effectiveness of etching processes.

Latest Patents

Whetsel holds a patent for an "Isolation substrate ring for plasma reactor." This invention features a radio frequency (RF) glow discharge plasma etch electrode design that is capable of creating high power density plasma with uniform etch rates. The design allows for automatic loading of semiconductor wafers from outside the plasma region. The electrode assembly consists of an electrode to which RF energy is applied, surrounded by an insulator and a grounded surface, all maintaining cylindrical symmetry. This configuration effectively combines high power density plasma while providing a channel for gas flow and optical observation of the plasma. The design is particularly beneficial for high rate, uniform, anisotropic etching, especially for silicon dioxide.

Career Highlights

Whetsel's career is marked by his work at Texas Instruments Corporation, where he has contributed to advancements in semiconductor technology. His innovative designs have played a crucial role in improving plasma reactor efficiency, which is vital for the production of semiconductor devices.

Collaborations

Throughout his career, Whetsel has collaborated with notable colleagues, including Cecil J Davis and John E Spencer. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Joseph E Whetsel's contributions to plasma reactor technology exemplify the impact of innovative thinking in the semiconductor industry. His patent for the isolation substrate ring demonstrates his commitment to enhancing etching processes, which are essential for modern electronics. His work continues to influence the field and inspire future innovations.