Joseph E Page

Title: Joseph E. Page: Innovator in Chemical-Mechanical Polishing

Introduction

Joseph E. Page is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) processes. His innovative work has led to the development of a patented method that enhances the efficiency of metal interconnect materials.

Latest Patents

Joseph E. Page holds a patent for a metallized pad polishing process. This process involves polishing a metal interconnect material to form a metal plug. The method includes the application of titanium to the surface of a polishing pad using various techniques. These techniques include abrasively applying titanium with a titanium block or integrating a titanium body with a carrier ring. Additionally, titanium can be applied by impregnating a felt layer with titanium particles or by adding titanium directly to the polishing slurry. This patent showcases his expertise in improving CMP processes.

Career Highlights

Joseph E. Page has had a distinguished career, working with Motorola Corporation. His role at the company has allowed him to contribute to advancements in technology and innovation. His work has been instrumental in enhancing the performance of polishing processes used in semiconductor manufacturing.

Collaborations

Throughout his career, Joseph has collaborated with notable colleagues, including Charles W. Stager and Thomas Sachio Kobayashi. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Joseph E. Page is a prominent figure in the realm of chemical-mechanical polishing, with a patented process that demonstrates his innovative spirit. His contributions to the industry continue to influence the development of advanced polishing techniques.