This inventor holds 1 USPTO granted patent. Top assignee: Morton International, Inc.. Active years: 1993.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993
Title: Joseph E. Oberlander: Innovator in Photoresist Technology
Introduction
Joseph E. Oberlander is a notable inventor based in Tustin, California. He has made significant contributions to the field of photoresist technology, particularly with his innovative patent that enhances the performance of positive photoresists.
Latest Patents
Oberlander's most recent patent focuses on a positive photoresist containing dyes. This formulation includes an alkali-soluble novolac resin and a quinone diazide sensitizer, which is enhanced by a dye that reduces reflective notching. The dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 parts per hundred resin (phr). This advancement is crucial for improving the quality and efficiency of photoresist applications in various technologies.
Career Highlights
Joseph E. Oberlander is associated with Morton International, Inc., where he has been instrumental in developing innovative materials for the semiconductor industry. His work has led to advancements that are essential for modern manufacturing processes.
Collaborations
Throughout his career, Oberlander has collaborated with notable colleagues, including Sunit S. Dixit and Richard M. Lazarus. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Joseph E. Oberlander is a distinguished inventor whose contributions to photoresist technology have made a lasting impact on the industry. His innovative patent demonstrates his commitment to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile