Company Filing History:
Years Active: 1983-1984
Title: Joseph A Maher, Jr: Innovator in Plasma Etching Technology
Introduction
Joseph A Maher, Jr. is a notable inventor based in Hamilton, MA (US). He has made significant contributions to the field of plasma etching technology, holding 2 patents that showcase his innovative approach to semiconductor manufacturing.
Latest Patents
One of his latest patents is the Plasma Cassette Etcher. This invention involves a multi-planar electrode plasma etching system designed for dry plasma etching of multiple planar thin-film semiconductor wafers simultaneously. The system operates within a compact chamber that houses a vertically-stacked array of laminar electrode sub-assemblies. Each sub-assembly consists of a pair of oppositely-excited electrode plates that sandwich a solid insulating layer of dielectric material. The design allows for uniform plasma etching across all wafers, utilizing RF discharges to excite an inert ambient gas into reactive plasma. The innovative transport mechanism for individual wafers is facilitated by a reciprocatable arm, ensuring efficient loading and unloading processes.
Career Highlights
Joseph A Maher, Jr. has established himself as a key figure in the semiconductor industry through his work at Drytek, Inc. His expertise in plasma etching has contributed to advancements in the manufacturing processes of semiconductor devices.
Collaborations
He has collaborated with notable professionals in the field, including his coworker Arthur W Zafiropoulo, to further enhance the capabilities and applications of plasma etching technology.
Conclusion
Joseph A Maher, Jr. continues to be a driving force in the innovation of plasma etching technology, with his patents reflecting a commitment to advancing semiconductor manufacturing processes. His work at Drytek, Inc. and collaborations with industry experts underscore his significant impact in this field.