Joren Severi

Title: Joren Severi: Innovator in Pattern Height Metrology

Introduction

Joren Severi is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of metrology, particularly in the area of pattern height measurement using advanced technologies.

Latest Patents

One of his key patents is titled "Pattern height metrology using an e-beam system." This patent focuses on determining the height of patterns produced with extreme ultraviolet (EUV) lithography in a resist film. The innovative approach utilizes an electron beam (e-beam) system, specifically a scanning electron microscope (SEM). The device described in the patent includes a processor that obtains SEM images and determines contrast values related to the patterns. Ultimately, the processor calculates the pattern height based on calibration data and the determined contrast value. Joren Severi holds 1 patent in this domain.

Career Highlights

Throughout his career, Joren has worked with prominent organizations such as Imec Vzw and Katholieke Universiteit Leuven. His experience in these institutions has allowed him to develop and refine his expertise in metrology and lithography.

Collaborations

Joren has collaborated with talented individuals in his field, including Gian Francesco Lorusso and Mohamed Saib. These partnerships have contributed to his innovative work and advancements in technology.

Conclusion

Joren Severi is a distinguished inventor whose work in pattern height metrology has the potential to impact various industries. His contributions to the field demonstrate the importance of innovation in advancing technology.