Joon Mo Kang

Title: Innovations by Joon Mo Kang in Semiconductor Processing

Introduction

Joon Mo Kang is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor processing. He has developed a unique method aimed at improving the efficiency of chemical mechanical polishing, a critical process in semiconductor manufacturing. His innovative approach addresses common challenges faced in the industry.

Latest Patents

Joon Mo Kang holds a patent for a method designed to reduce dishing in chemical mechanical polishing. This method is particularly relevant for semiconductor wafers that have a dielectric layer with trenches and a copper layer deposited over it. The process involves several steps, including the removal of excess copper and the application of chemical treatment to form a protective layer over copper residues. This innovative technique enhances the overall quality of semiconductor wafers by minimizing defects during the polishing process.

Career Highlights

Kang is associated with Singapore Science Park II, where he continues to work on advancements in semiconductor technology. His expertise in chemical mechanical polishing has positioned him as a valuable asset in the field. His work not only contributes to the efficiency of semiconductor manufacturing but also enhances the reliability of electronic devices.

Collaborations

Joon Mo Kang collaborates with talented professionals in his field, including Shaoyu Wu and Pang Dow Foo. These collaborations foster an environment of innovation and knowledge sharing, further driving advancements in semiconductor processing.

Conclusion

Joon Mo Kang's innovative methods in semiconductor processing exemplify the importance of research and development in technology. His contributions significantly impact the efficiency and quality of semiconductor manufacturing processes.