Company Filing History:
Years Active: 2018-2019
Title: Jonq-Hai Chiu: Innovator in Solids Flow Control Technology
Introduction
Jonq-Hai Chiu is a notable inventor based in West Hartford, CT (US). He has made significant contributions to the field of solids flow control technology. With a total of 2 patents to his name, Chiu's work focuses on innovative systems and methods for managing the flow of materials.
Latest Patents
Chiu's latest patents include a "System, method and apparatus for controlling the flow direction, flow rate and temperature of solids." This invention features an apparatus designed to control the flow of materials through an inlet, utilizing a seal mechanism and a fluidizing bed. The system allows for selective diversion of material flow into two discharge passageways, enhancing the efficiency of material transport.
Another significant patent is the "System and method and apparatus for maintaining a pressure balance in a solids flow loop and for controlling the flow of solids therethrough." This system incorporates a standpipe that receives a flow of solids, along with a sealpot that fluidizes and transports the solids. The design aims to optimize the solids-to-gas ratio, improving the overall flow dynamics.
Career Highlights
Jonq-Hai Chiu is currently employed at General Electric Technology GmbH, where he continues to develop innovative solutions in his field. His expertise in solids flow control has positioned him as a key contributor to advancements in technology.
Collaborations
Chiu has collaborated with notable colleagues, including Herbert E Andrus, Jr and Christoph Herbert Weingaertner. These partnerships have fostered a collaborative environment that enhances innovation and problem-solving in their projects.
Conclusion
Jonq-Hai Chiu's contributions to solids flow control technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material dynamics and a drive to improve industrial processes. Chiu's work continues to influence the field and inspire future advancements.