Company Filing History:
Years Active: 2001
Title: Jong-sik Won: Innovator in Semiconductor Technology
Introduction
Jong-sik Won is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist mask removal.
Latest Patents
Jong-sik Won holds 1 patent for a method titled "Method for removing photoresist mask used for etching of metal layer and other etching by-products." This innovative method effectively removes polymers produced as by-products during the etching of a metal layer. The process involves pretreating the semiconductor substrate by supplying nitrogen gas into the ashing chamber under vacuum conditions. This pretreatment modifies the polymer by-products, facilitating their removal during the ashing process.
Career Highlights
Jong-sik Won is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in improving the efficiency of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues, including Tae-ryong Kim and Jae-pil Kim, contributing to various projects within the semiconductor industry.
Conclusion
Jong-sik Won's innovative approach to semiconductor technology exemplifies the importance of advancements in the field. His contributions, particularly in photoresist mask removal, highlight the ongoing evolution of semiconductor manufacturing processes.