Bucheon, South Korea

Jong-min Kim


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Jong-min Kim in Semiconductor Technology.

Introduction

Jong-min Kim is a notable inventor based in Bucheon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of high voltage semiconductor devices. His innovative approach has led to advancements that enhance device performance and reliability.

Latest Patents

Jong-min Kim holds a patent for a "Method of fabricating a high voltage semiconductor device using SIPOS." This invention involves a high voltage semiconductor device that includes a semiconductor substrate with a semi-insulating polycrystalline silicon layer. This layer alleviates electric field concentration in the field region. A thermal oxide layer is formed on the semi-insulating polycrystalline silicon layer, serving as a protective layer. This thermal oxide layer creates a superior interface compared to other oxide layers, significantly reducing leakage current. Additionally, it provides high surface protection and resistance against dielectric breakdown, while also allowing for a reduction in fabrication time. The removal of the semi-insulating polycrystalline silicon layer from the active region prevents a decrease in the direct current gain of the device.

Career Highlights

Jong-min Kim is currently employed at Fairchild Korea Semiconductor Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in developing devices that meet the growing demands of modern electronics.

Collaborations

Jong-min Kim has collaborated with colleagues such as Jin-kyeong Kim and Kyung-Wook Kim, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Jong-min Kim's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patent for a high voltage semiconductor device showcases his commitment to enhancing device performance and efficiency. His work at Fairchild Korea Semiconductor Ltd. continues to influence the industry positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…