Jong-Lak Kim

Title: Jong-Lak Kim: Innovator in Contour Approximation Technology

Introduction

Jong-Lak Kim is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of contour approximation technology. His innovative work has led to the development of a unique patent that enhances the representation of contour images.

Latest Patents

Jong-Lak Kim holds a patent for a "Contour approximation apparatus for representing a contour of an object." This apparatus includes a polygonal approximation section that determines the number of vertices on a contour image. It fits the contour image with multiple line segments to provide a polygonal approximation. Additionally, it features a sampling circuit that provides N sample points for each line segment. An error detector calculates errors for each sample point, producing a set of errors for each line segment. The apparatus also includes a discrete sine transform and quantization block that transforms the set of errors into discrete sine transform coefficients and converts them into quantized transform coefficients.

Career Highlights

Jong-Lak Kim is currently employed at Daewoo Electronics Co., Ltd. His work at this company has allowed him to focus on innovative technologies that improve image processing and representation. His expertise in contour approximation has positioned him as a valuable asset in the field.

Collaborations

Jong-Lak Kim collaborates with Jin-Hun Kim, who is also involved in similar technological advancements. Their partnership has fostered a creative environment that encourages innovation and development in contour approximation technologies.

Conclusion

Jong-Lak Kim's contributions to contour approximation technology through his patent and work at Daewoo Electronics Co., Ltd. highlight his role as an influential inventor. His innovative approaches continue to shape the future of image processing.