Jong Ju Park

Title: Jong Ju Park: Innovator in Photomask Technology

Introduction

Jong Ju Park is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work is instrumental in advancing the manufacturing processes used in semiconductor devices.

Latest Patents

One of his latest patents is for a reflective photomask and method for fabricating the same. This innovative reflective photomask includes a pattern area, a non-pattern area at least partially surrounding the pattern area, and a black border area interposed between the pattern area and the non-pattern area. The design features a mask substrate, a reflector layer stacked on the mask substrate, and an absorber layer stacked on the reflector layer. The black border area is designed with a plurality of first anneal patterns arranged along the edge of the pattern area, each having an island shape, along with a second anneal pattern that fills the inside of the black border area and has a line shape.

Another significant patent is for an inspection apparatus for detecting defects in photomasks and dies. This defect inspecting apparatus includes a reference image generator that creates a first and second reference image from design layout data. An image inspector obtains inspection images of different regions of a photomask, while an operation processor extracts coordinate offsets by comparing these inspection images with the reference images.

Career Highlights

Jong Ju Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop new technologies in the semiconductor industry. His work has been pivotal in enhancing the quality and efficiency of photomask production.

Collaborations

He collaborates with notable colleagues, including Kang Won Lee and Cheol Ki Min, who contribute to his projects and research endeavors.

Conclusion

Jong Ju Park is a key figure in the field of photomask technology, with a focus on innovative solutions that improve manufacturing processes. His contributions are vital to the advancement of semiconductor technology, and his patents reflect his expertise and commitment to innovation.