Jong Hwa Lee

Title: Jong Hwa Lee: Innovator in Anisotropic Conductive Film Technology

Introduction

Jong Hwa Lee is a notable inventor based in Siheung-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of anisotropic conductive films. His innovative work has led to the filing of a patent that enhances the performance of electronic components.

Latest Patents

Jong Hwa Lee holds a patent for an anisotropic conductive film forming composition. This composition includes at least one polymer containing a silane group, a polymerizable compound, and a plurality of conductive particles. The polymer may consist of an elastomeric polymer and a filler polymer, with at least one containing a silane group. The polymerizable compound may include a cross-linking agent and/or a polymerization reaction enhancer, which may also have a silane group. Additionally, the film forming composition may include a solvent. This innovative composition results in an anisotropic conductive film that exhibits enhanced peel and adhesive strength, as well as low electrical contact resistance. He has 1 patent to his name.

Career Highlights

Jong Hwa Lee is associated with Cheil Industries Inc., where he applies his expertise in materials science to develop advanced technologies. His work at the company has positioned him as a key player in the innovation of conductive materials for electronic applications.

Collaborations

He has collaborated with notable colleagues such as Ki Sung Jung and Jeong Ku Kang, contributing to the advancement of their shared projects and innovations.

Conclusion

Jong Hwa Lee's contributions to the field of anisotropic conductive films demonstrate his commitment to innovation and excellence in materials science. His patent reflects a significant advancement in technology that benefits the electronics industry.