Company Filing History:
Years Active: 2010-2012
Title: Jong-ho Park: Innovator in Semiconductor Technology
Introduction
Jong-ho Park is a prominent inventor based in Incheon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronic applications.
Latest Patents
Jong-ho Park's latest patents include a semiconductor device and a method of fabricating the same. This invention provides a semiconductor device utilizing a DMOS device, which consists of a semiconductor substrate with a first conductive type well. The device features a first conductive type gate electrode, a second conductive type body electrode, and a first conductive type drain electrode, among other components. Another notable patent involves a semiconductor device formed using a single polysilicon process, which includes a source/drain and a gate created through a doped polysilicon process. This method outlines the steps for forming a gate insulating layer, implanting impurities, and patterning the conductive layer.
Career Highlights
Jong-ho Park is currently employed at Fairchild Korea Semiconductor Ltd., where he continues to advance semiconductor technology. His expertise in the field has positioned him as a key player in the development of innovative semiconductor solutions.
Collaborations
Throughout his career, Jong-ho Park has collaborated with talented coworkers, including Hyi-Jeong Park and Chang-ki Jeon. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Jong-ho Park's contributions to semiconductor technology through his patents and work at Fairchild Korea Semiconductor Ltd. highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of electronic devices.