Company Filing History:
2 out of 3,785 
2 out of 832,912 Years Active: 2002-2003
Title: Innovations by Jonathan E Borkowski
Introduction
Jonathan E Borkowski is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of wafer processing technology, holding a total of four patents. His work focuses on improving methods for drying wafers and substrates, which are critical in semiconductor manufacturing.
Latest Patents
One of his latest patents is a "Wafer drying apparatus and method." This invention involves removing liquid from wafers that have been wet in a liquid bath. The wafer and the bath are separated at a controlled rate, ensuring that a meniscus forms between the liquid bath and the wafer's surface. The design includes a gas-filled volume defined by a hot chamber that continuously transfers thermal energy to the wafer. Hot gas is directed into this volume, effectively drying the wafer.
Another significant patent is the "Apparatus for drying batches of disks." This invention describes a method for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume, with controlled rates of movement to maintain a thin layer of liquid on each substrate. The thermal energy transferred in the gas-filled volume evaporates this layer without disrupting the separation rate between the substrates and the bath.
Career Highlights
Throughout his career, Jonathan has worked with Lam Research Corporation, where he has contributed to advancements in semiconductor manufacturing technologies. His expertise in wafer processing has positioned him as a key figure in the industry.
Collaborations
Jonathan has collaborated with notable professionals in his field, including Oliver David Jones and Kenneth C McMahon. Their combined efforts have led to innovative solutions in wafer drying technologies.
Conclusion
Jonathan E Borkowski's contributions to wafer processing technology through his patents demonstrate his commitment to innovation in the semiconductor industry. His work continues to influence the methods used in manufacturing, ensuring efficiency and effectiveness in the drying processes of wafers and substrates.