Jonathan C Shaw

Title: Innovations of Jonathan C Shaw

Introduction

Jonathan C Shaw is a notable inventor based in Oakland, CA. He has made significant contributions to the field of technology, particularly in the area of semiconductor processing. With a total of 4 patents to his name, Shaw has demonstrated a commitment to advancing innovation in his industry.

Latest Patents

One of Shaw's latest patents is for a method of selective barrier metal etching. This innovative process involves performing a hydrogen implantation in an inductively coupled plasma (ICP) etch chamber. The method aims to chemically reduce an oxidized portion of a barrier metal layer, allowing for effective etching. Another significant patent focuses on methods of processing DRAM. This method enhances line edge roughness (LER) and reduces resistance by implanting an inert species into a bit line metal layer, resulting in improved performance.

Career Highlights

Jonathan C Shaw is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in developing advanced technologies that improve manufacturing processes. Shaw's expertise and innovative approaches have positioned him as a key figure in his field.

Collaborations

Throughout his career, Shaw has collaborated with talented individuals such as Priyadarshi Panda and Gene S Lee. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jonathan C Shaw's contributions to the field of semiconductor processing are noteworthy. His innovative patents and collaborative efforts reflect his dedication to advancing technology. Shaw continues to be a significant player in the industry, driving progress through his inventive spirit.