Jon Reese

Title: Jon Reese: Innovator in Plasma Etch Reactor Technology

Introduction

Jon Reese is a notable inventor based in Waxahachie, Texas. He has made significant contributions to the field of plasma etching technology, particularly in the area of production process diagnosis. His innovative approach has led to advancements that enhance the efficiency and reliability of etching operations.

Latest Patents

Jon Reese holds a patent for an "Apparatus and method for production process diagnosis using dynamic time." This patent focuses on monitoring the operations of a plasma etch reactor to detect aberrations in etching processes. The invention defines a reference end point trace for the etch process and utilizes a dynamic time warping matching function to analyze the etching operations. By comparing the actual end point trace with the reference trace, the system can identify any abnormalities that may occur during the etching process.

Career Highlights

Jon Reese is currently employed at Texas Instruments Corporation, where he continues to develop and refine technologies related to plasma etching. His work has been instrumental in improving the accuracy and effectiveness of etching processes in semiconductor manufacturing.

Collaborations

Throughout his career, Jon has collaborated with several talented individuals, including Bruce E. Flinchbaugh and Steven B. Dolins. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jon Reese's contributions to plasma etch reactor technology exemplify the spirit of innovation in the field of semiconductor manufacturing. His patent and ongoing work at Texas Instruments Corporation highlight his commitment to advancing technology and improving production processes.