Company Filing History:
Years Active: 1990-1999
Title: Jon Erik Lieberman: Innovator in Electron Beam Lithography
Introduction
Jon Erik Lieberman is a notable inventor based in Montgomery, NY (US). He has made significant contributions to the field of electron beam lithography, holding 2 patents that showcase his innovative approach to pattern processing systems.
Latest Patents
Lieberman's latest patents include a High Speed Electron Beam Lithography Pattern Processing System. This system features a pattern storage device for storing pattern data, a Redundant Array of Independent Disks (RAID) pattern memory buffer for temporarily holding the pattern data, and a shape processor that decodes the pattern data using a programmable gate array device (FPGA). This allows for high-speed processing and efficient use of disk space through a Previous Output Shape (POS) Register. Another significant patent is the Tri-Deflection Electron Beam System, which employs a three-stage deflection system that breaks the scanning field into clusters and sub-fields. This innovative approach enhances the scanning process, allowing for precise exposure within each cluster.
Career Highlights
Jon Erik Lieberman is currently employed at International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in the field of electron beam lithography. His work has contributed to advancements in high-speed processing and efficient data management.
Collaborations
Lieberman has collaborated with notable coworkers such as Donald E. Davis and Cecil T. Ho, further enhancing the innovative environment in which he works.
Conclusion
Jon Erik Lieberman's contributions to electron beam lithography through his patents and work at IBM highlight his role as a significant innovator in the field. His advancements continue to influence the technology landscape, showcasing the importance of innovation in modern engineering.