Company Filing History:
Years Active: 1999-2000
Title: Innovations of John Y Adachi
Introduction
John Y Adachi is a notable inventor based in Los Altos, California. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 2 patents, his work focuses on minimizing stress in tungsten and tungsten silicide films.
Latest Patents
Adachi's latest patents include innovative methods for processing substrates in a CVD reactor system. One patent details an apparatus and methods for minimizing as-deposited stress in tungsten. This involves the use of preflow and postflow of reducing gases before and after deposition steps. This ensures that a tungsten-rich film is not deposited at the interface of the tungsten silicide film to the substrates. Another patent outlines similar methods for minimizing as-deposited stress in tungsten silicide films, emphasizing the importance of controlling gas flow during deposition sequences.
Career Highlights
John Y Adachi is currently employed at Genus, Inc., where he continues to develop advanced technologies in the semiconductor industry. His expertise in CVD processes has positioned him as a key player in the field.
Collaborations
Throughout his career, Adachi has collaborated with notable colleagues such as Sien G Kang and David Badt. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
John Y Adachi's contributions to the field of CVD technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor processing.