Oxford, ME, United States of America

John W Sawyer

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 69(Granted Patents)


Location History:

  • Oxford, ME (US) (1985 - 1986)
  • Indianapolis, IN (US) (2016)
  • Rockport, MA (US) (2020)

Company Filing History:


Years Active: 1985-2020

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5 patents (USPTO):Explore Patents

Title: The Innovations of John Sawyer from Rockport, MA

Introduction

John Sawyer is an accomplished inventor based in Rockport, Massachusetts, known for his contributions to advancements in scanning technology. With a unique patent to his name, Sawyer has made strides in improving the precision of scanned spot beams, critical for various applications in the field of implantation systems.

Latest Patents

Sawyer's notable patent, titled "System and Method for Improved Scanned Spot Beam," presents a comprehensive solution for generating multiple scan profiles based on a desired implant pattern while accounting for the uniformity of the spot beam. This innovative system scans the spot beam and records the number of ions as a function of position, leading to the development of a linear uniformity array. By combining the desired implant pattern with this array, Sawyer's invention is able to create composite pattern arrays that effectively counter the non-uniformity of scanned beams. Furthermore, the software can be executed on the controller within the implantation system or on separate computing devices, enhancing its versatility.

Career Highlights

John Sawyer is associated with Applied Materials, Inc., a leader in materials engineering solutions. His work here emphasizes innovation in technology, particularly in enhancing the efficiency and accuracy of scanning systems. With a single patent under his belt, Sawyer’s contributions are already making waves in the industry.

Collaborations

Throughout his career, Sawyer has collaborated with talented colleagues such as Stanislav S. Todorov and Jeffrey Morse. These partnerships not only strengthen his efforts in research and development but also expand the scope of innovative solutions originating from Applied Materials, Inc.

Conclusion

John Sawyer’s inventive spirit and breakthrough technology serve as an inspiration in the field of scanning technology. His patent stands testament to his commitment to improving the intricacies of implantation systems. As the industry continues to evolve, Sawyer's contributions signal a promising future for advancements in innovation and technology.

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