Location History:
- Rolla, MO (US) (1990)
- Farmington, MN (US) (1997)
Company Filing History:
Years Active: 1990-1997
Title: The Innovations of John W. Arnold
Introduction
John W. Arnold is a notable inventor based in Rolla, MO (US). He has made significant contributions to the field of integrated circuit technology. With a total of 2 patents, Arnold's work focuses on enhancing the quality and efficiency of photo-resist materials used in semiconductor manufacturing.
Latest Patents
Arnold's latest patents include an innovative anti-reflective coating. This light-absorbing medium is designed to be interposed under photosensitive layers, such as photo-resist for integrated circuit chips. The coating features a polymer vehicle that can penetrate small depressions in a substrate, forming a thin, smooth, and uniform layer. It includes a light-absorbing dye that is imageable in the process. This material effectively eliminates many defects caused by reflected light, resulting in increased sharpness of images in the photo-resist. Consequently, it reduces losses due to defects and enhances the yield of usable products.
Career Highlights
Arnold is currently associated with Brewer Science, Inc., a company known for its advancements in materials for the semiconductor industry. His work has been pivotal in improving the manufacturing processes of integrated circuits.
Collaborations
Arnold has collaborated with notable colleagues such as Terry Lowell Brewer and Sumalee Punyakumleard. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
John W. Arnold's contributions to the field of integrated circuits through his innovative patents demonstrate his commitment to advancing technology. His work continues to impact the semiconductor industry positively.