Anthem, AZ, United States of America

John Sirman

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: John Sirman**

Introduction

John Sirman, based in Anthem, AZ, is an accomplished inventor known for his innovative contributions to the field of semiconductor applications. With a focus on enhancing substrate supports, Sirman has secured a patent that addresses critical challenges in the manufacturing process of semiconductor devices.

Latest Patents

Sirman's patent, titled "Substrate supports for semiconductor applications," involves a cutting-edge design that includes dielectric multilayers. These multilayers serve as protective barriers against erosion and corrosion in harsh environments, such as plasma treating vessels and deposition chambers. The invention features a dual-layering system, comprising an undercoat dielectric layer and a topcoat dielectric layer, each with distinct material properties that enhance their performance. Notably, the topcoat layer, containing less than 1% aluminum oxide, offers superior resistance to corrosion and plasma erosion compared to the undercoat layer, making it essential for the durability and efficiency of electrostatic chucks used in semiconductor manufacturing.

Career Highlights

John Sirman is associated with Fm Industries, Inc., where he continues to drive innovation in semiconductor technology. His work demonstrates a profound understanding of materials science, particularly in relation to dielectric properties and the challenges faced in semiconductor production.

Collaborations

In his role at Fm Industries, Inc., Sirman collaborates closely with his coworker, Jaeyong Cho. Together, they leverage their combined expertise to advance the development of substrates needed for high-performance semiconductor devices. This partnership has likely fostered a productive environment for innovation, facilitating the sharing of ideas and techniques essential for their industry.

Conclusion

John Sirman exemplifies the spirit of innovation in his field with his patent on substrate supports for semiconductor applications. His contributions not only enhance manufacturing processes but also pave the way for future advancements in semiconductor technology. As industries evolve, inventors like Sirman will remain pivotal in driving progress and ensuring the development of more efficient, reliable technologies.

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