Company Filing History:
Years Active: 1996
Title: The Innovative Contributions of John Sapio
Introduction
John Sapio is a notable inventor based in Huntington, NY (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative approach focuses on minimizing contamination in gas flow systems, which is crucial for maintaining the integrity of CVD processes.
Latest Patents
John Sapio holds a patent for a "Gas flow system for CVD reactor." This invention aims to reduce contamination of gas flow lines and reactor surfaces caused by high impurity concentrations present in the CVD reactor. The design includes a dopant gas supply located close to the reactor input port, with a separate venting system for the dopant gas supply line. The system features first and second dopant gas supplies and a diluent gas supply connected to branch lines that converge into a single dopant supply line. A solenoid valve is strategically placed in the main dopant supply line near the input port, and a vent line is connected to the dopant supply line before the solenoid valve. Additionally, the etchant and silicon gas supplies are each connected to the reactor input via separate supply lines, which are vented independently from the dopant gas supply line. This innovative design enhances the efficiency and reliability of CVD processes.
Career Highlights
John Sapio is currently employed at Gi, LLC, where he continues to develop and refine technologies related to CVD systems. His work has been instrumental in advancing the capabilities of gas flow systems in various applications.
Collaborations
Throughout his career, John has collaborated with talented individuals such as Joseph Y Chan and Dennis Garbis. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
John Sapio's contributions to the field of CVD technology exemplify the importance of innovation in enhancing industrial processes. His patent for a gas flow system demonstrates a commitment to improving efficiency and reducing contamination in critical applications.