John S Miller

Title: Innovations of John S. Miller in Atomic Layer Deposition

Introduction

John S. Miller is an accomplished inventor based in Walnut Creek, CA. He has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition. His innovative work has led to the development of a unique method for enhancing optical materials used in laser technology.

Latest Patents

Miller holds a patent titled "System and method for atomic layer deposition of rare-earth oxides on optical grade materials for laser gain media." This patent describes a method for doping powder particles using a sophisticated process involving a central chamber, heated precursors, and carrier gases. The method allows for the creation of a monolayer coating on powder particles, which is then modified to form an oxide coating, enhancing the properties of the materials used in laser applications. He has 1 patent to his name.

Career Highlights

Miller is currently employed at Lawrence Livermore National Security, LLC, where he continues to push the boundaries of innovation in his field. His work is instrumental in advancing technologies that rely on high-performance optical materials.

Collaborations

Miller has collaborated with notable colleagues, including Selim Elhadj and Thomas M. Spinka. Their combined expertise contributes to the success of their projects and the advancement of their research.

Conclusion

John S. Miller's contributions to atomic layer deposition represent a significant advancement in materials science. His innovative methods and collaborative efforts continue to influence the development of cutting-edge technologies in laser applications.