John Robert Barthel

Title: The Innovations of John Robert Barthel

Introduction

John Robert Barthel is a notable inventor based in East Nassau, NY (US). He has made significant contributions to the field of integrated circuit fabrication. His innovative approach has led to the development of a unique method for enhancing step coverage of thin films on patterned substrates.

Latest Patents

Barthel holds a patent for "Enhanced step coverage of thin films on patterned substrates by oblique angle PVD." This patent describes a method and apparatus for fabricating integrated circuits. The process involves directing a vapor flux toward a substrate surface from multiple directions associated with various azimuth angles. By selecting a deposition angle of the vapor flux relative to normal incidence, Barthel's method achieves a substantially conformal film. This technique is particularly beneficial for surface features such as vias and trenches.

Career Highlights

Barthel is affiliated with Rensselaer Polytechnic Institute, where he continues to advance his research and innovations. His work has garnered attention for its potential applications in the semiconductor industry.

Collaborations

Throughout his career, Barthel has collaborated with esteemed colleagues, including Tansel Karabacak and Toh-Ming Lu. These partnerships have further enriched his research and contributed to the advancement of technology in his field.

Conclusion

John Robert Barthel's contributions to integrated circuit fabrication exemplify the spirit of innovation. His patented methods are paving the way for advancements in semiconductor technology.