Company Filing History:
Years Active: 1996
Title: John R Delude: Innovator in Photopolymerization
John R Delude is a notable inventor based in Belchertown, MA (US). He has made significant contributions to the field of photopolymerization, particularly through his innovative patent.
Latest Patents
John R Delude holds a patent for a light-sensitive composition titled "Benzanthrone polymerization gate in photopolymerizable compositions." This invention includes a photopolymerizable compound, a free radical generating component, and a benzanthrone or substituted benzanthrone. The composition is designed to prevent photopolymerization when exposed to actinic radiation below a certain threshold, while allowing photopolymerization above that threshold. This unique gate effect minimizes unwanted partial exposure in non-image areas, thereby enhancing reproduction quality. He has 1 patent to his name.
Career Highlights
John R Delude is currently employed at International Paper Company, where he applies his expertise in photopolymerization. His work has contributed to advancements in the field, particularly in improving the quality of photopolymerizable compositions.
Collaborations
Throughout his career, John has collaborated with talented individuals such as Maria T Sypek and Paul A Perron. These collaborations have further enriched his work and contributed to the success of his projects.
Conclusion
John R Delude is a distinguished inventor whose work in photopolymerization has made a significant impact on the industry. His innovative patent demonstrates his commitment to enhancing reproduction quality through advanced light-sensitive compositions.