John P Verboncoeur

Title: John P Verboncoeur: Innovator in Gas Breakdown Technology

Introduction

John P Verboncoeur is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of gas breakdown technology, holding a total of 3 patents. His work focuses on innovative devices and processes that enhance the efficiency of gas phase dry etching.

Latest Patents

Verboncoeur's latest patents include a microscale gas breakdown device and process. This device features a first and second surface that define a gap distance, with a perturbation on one of the surfaces characterized by a height and radius value. It is equipped with a current or voltage source that applies energy across the surfaces, resulting in discharges that travel along defined paths based on pressure conditions. Another significant patent is related to process optimization in gas phase dry etching. This method involves designing a reactor that includes a substrate with a film, chemical etching to define a profile, and extracting reaction rate constants to improve reactor design.

Career Highlights

Throughout his career, Verboncoeur has worked with Michigan State University, where he has contributed to research and development in his field. His innovative approaches have led to advancements in plasma etching technology, making him a respected figure in the industry.

Collaborations

Verboncoeur has collaborated with notable individuals such as Daniel L Flamm and Yangyang Fu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

John P Verboncoeur's contributions to gas breakdown technology and plasma etching processes highlight his role as a leading inventor in the field. His patents and collaborations reflect a commitment to advancing technology and improving industrial applications.