San Jose, CA, United States of America

John P Jordon


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: John P. Jordon: Innovator in Plasma Processing Technology

Introduction

John P. Jordon is a notable inventor based in San Jose, California, recognized for his impactful contributions to the field of plasma processing technology. He has developed innovative solutions aimed at improving the efficiency and quality of semiconductor manufacturing processes. His most significant work results in a patent that addresses challenges commonly faced in this sector.

Latest Patents

John P. Jordon holds a patent titled "Apparatus for Reducing Process Drift in Inductive Coupled Plasma Etching." This invention describes a plasma processing chamber equipped with a substrate holder and a gas distribution plate, where the inner surface of the plate is maintained below a threshold temperature to effectively minimize process drift during substrate processing. A key feature of this invention is the incorporation of heat transfer gas, such as helium, added to the process gas through the gas distribution plate. This innovation controls the temperature of the inner surface, ensuring the quality of processed substrates, especially during the oxide etching of semiconductor wafers, is preserved throughout sequential processing.

Career Highlights

John P. Jordon is affiliated with Lam Research Corporation, a company renowned for its advanced technologies in semiconductor manufacturing. His work has not only contributed to Lam Research's portfolio of innovations but has also helped advance industry standards in plasma etching processes.

Collaborations

During his career, John has collaborated with knowledgeable coworkers, including Prashant Gadgil and Janet M. Flanner. These collaborations have fostered an environment of shared expertise and innovation, leading to the development of cutting-edge technology in the field of plasma processing.

Conclusion

In conclusion, John P. Jordon stands out as an influential inventor in the semiconductor industry. His patent for reducing process drift in inductive coupled plasma etching showcases his commitment to improving manufacturing processes and ensuring higher quality outcomes. With his continued contributions while working at Lam Research Corporation, Jordon remains an important figure in advancing plasma processing technology.

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