Company Filing History:
Years Active: 1998
Title: John Magvas: Innovator in Photoresist Development
Introduction
John Magvas is a notable inventor based in Piscataway, NJ (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative methods and compositions.
Latest Patents
Magvas holds a patent for a "Method of developing positive photoresist and compositions therefor." This invention illustrates a method and composition for developing positive photoresists. The developer includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class, most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties. He has 1 patent to his name.
Career Highlights
John Magvas is currently employed at Clariant Finance (BVI) Limited, where he continues to advance his work in the field of photoresist development. His expertise and innovative approach have positioned him as a valuable asset in his company.
Collaborations
Some of his notable coworkers include Stanley A Ficner and Christopher F Lyons. Their collaboration has likely contributed to the advancements in their respective fields.
Conclusion
John Magvas is a distinguished inventor whose work in photoresist technology has made a significant impact. His innovative methods and compositions continue to influence the industry.