Location History:
- Churchville, MD (US) (2001)
- Churchville, NY (US) (2001)
Company Filing History:
Years Active: 2001
Title: John M Rzepka: Innovator in Photochemical Technology
Introduction
John M Rzepka is a notable inventor based in Churchville, MD (US). He has made significant contributions to the field of photochemical materials, holding a total of 3 patents. His work focuses on innovative container designs that enhance the safety and efficiency of photoprocessing materials.
Latest Patents
Rzepka's latest patents include a "Container for Photoprocessing Materials" and a "Photochemical Frangible Closure." The container features a frangible closure with a central weakness and varying thicknesses, allowing it to collapse under a predetermined force. This design ensures the safe handling of photochemical materials. The frangible closure patent also emphasizes a central weakness that resists shearing, enhancing the integrity of the closure while allowing for controlled fracture.
Career Highlights
John M Rzepka is associated with Eastman Kodak Company, where he has applied his expertise in photochemical technology. His innovative designs have contributed to advancements in the handling and storage of sensitive materials.
Collaborations
Throughout his career, Rzepka has collaborated with notable colleagues, including Scott H Schwallie and Gerald L Johnson. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
John M Rzepka's contributions to photochemical technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence the industry and improve the safety of photoprocessing materials.