Company Filing History:
Years Active: 2000
Title: Innovations in Hair Growth Inhibition by John Lee, Jr.
Introduction
John Lee, Jr. is an accomplished inventor based in Ridgefield, CT (US), known for his innovative contributions to the field of dermatology. He holds a patent that focuses on methods and devices for inhibiting hair growth and related skin treatments. His work has the potential to revolutionize how hair removal and skin treatments are approached.
Latest Patents
John Lee, Jr. holds a patent for "Methods and devices for inhibiting hair growth and related skin." This patent encompasses a variety of methods for applying laser light to the skin, which includes techniques for removing hair, synchronizing hair growth, stimulating hair growth, treating Herpes virus, and reducing sweat and body odor. The patent also details methods for the in situ formation of a chromophore in hair ducts, reducing light loss at the skin surface, grafting hair stem cells, and removing keloid or hypertrophic scars. His innovative hair removal methods involve controlling the proportions of photomechanical and photothermal damage through the selection of laser parameters, chromophore particle size, and pulse duration, with optional dynamic skin cooling.
Career Highlights
John Lee, Jr. is associated with Thermolase Corporation, where he has been instrumental in developing advanced laser technologies for skin treatments. His expertise in dermatological applications of laser technology has positioned him as a key figure in the industry.
Collaborations
John has collaborated with notable professionals in his field, including Nikolai I Tankovich and Kurt A Dasse. Their combined efforts have contributed to the advancement of laser applications in dermatology.
Conclusion
John Lee, Jr. is a pioneering inventor whose work in hair growth inhibition and skin treatment has significant implications for the future of dermatology. His innovative methods and devices continue to push the boundaries of what is possible in skin care and hair removal technologies.