Company Filing History:
Years Active: 1994-1996
Title: Innovations by John Latza
Introduction
John Latza is an accomplished inventor based in Lindenhurst, NY (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
One of John Latza's latest patents is a gas flow system for a CVD reactor. This invention aims to minimize contamination of gas flow lines and reactor surfaces from high impurity concentrations present in the CVD reactor. The control of the dopant gas supply is strategically located close to the reactor input port, and the dopant gas supply line is separately vented. The design includes first and second dopant gas supplies and a diluent gas supply connected to branch lines that converge to form the dopant supply line. A solenoid valve is positioned in the main dopant supply line as close to the input port as possible, with a vent line connected to the dopant supply line prior to the solenoid valve. Additionally, the etchant and silicon gas supplies are each connected to the reactor input by separate supply lines, which are vented separately from the dopant gas supply line.
Another notable patent by John Latza is a low-cost method of fabricating epitaxial semiconductor devices. This innovation achieves significant reductions in the cost of fabrication without sacrificing functional characteristics. The method eliminates the conventional but costly polishing procedure, opting instead for grinding, cleaning, and etching processes. The grinding removes material from the surface to a depth of at least 65 microns, followed by etching that further removes material to a depth of about 6-10 microns. This two-step grinding process, combined with an improved epitaxial process utilizing a unique two-step hydrochloric gas high-temperature etch, enhances the overall efficiency and economics of forming epitaxial semiconductor devices.
Career Highlights
John Latza is currently associated with Gi, LLC, where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in developing cost-effective solutions that improve manufacturing processes.
Collaborations
John has collaborated with notable coworkers, including Dennis Garbis and Joseph Y Chan, who have contributed to his projects and innovations.
Conclusion
John Latza's contributions to the field of semiconductor technology through his patents reflect his commitment to innovation and efficiency. His work continues to influence the industry and pave the