John Keihl

Title: John Keihl: Innovator in Plasma Processing Technology

Introduction

John Keihl is a notable inventor based in Versailles, Ohio, recognized for his contributions to the field of plasma processing technology. With a focus on enhancing the efficiency and functionality of semiconductor manufacturing, Keihl has made significant strides in innovation.

Latest Patents

Keihl holds a patent for "Anchoring inserts, electrode assemblies, and plasma processing chambers." This invention features a silicon-based showerhead electrode designed with backside inserts positioned in recesses along the electrode's backside. The inserts are engineered with a threaded outside diameter, a threaded inside diameter, and a tool engaging portion that prevents tools from extending beyond the threaded outside diameter. Additionally, the design includes torque-receiving slots to avoid on-axis rotation, enhancing the reliability of the electrode assembly.

Career Highlights

John Keihl is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on developing advanced technologies that improve plasma processing techniques, which are crucial for the production of integrated circuits.

Collaborations

Throughout his career, Keihl has collaborated with talented professionals, including coworkers Randall Hardin and Duane Lytle. These collaborations have fostered an environment of innovation and creativity, contributing to the advancement of plasma processing technologies.

Conclusion

John Keihl's innovative work in plasma processing technology exemplifies the impact of dedicated inventors in the semiconductor industry. His patent and contributions continue to influence the field, showcasing the importance of innovation in driving technological advancements.