Location History:
- Mattawan, MI (US) (2000 - 2003)
- Minneapolis, MN (US) (2004 - 2017)
Company Filing History:
Years Active: 2000-2017
Title: Innovations of John J Stronczer
Introduction
John J Stronczer is a notable inventor based in Mattawan, MI (US). He holds a total of 9 patents, showcasing his contributions to the field of technology and innovation. His work primarily focuses on devices that enhance power efficiency and performance in various applications.
Latest Patents
Among his latest patents is the "Pass device with boost voltage regulation and current gain for VCSEL driving applications." This invention is designed to drive a load efficiently by utilizing both a low current path and a high current path. The high current path is powered by a first voltage source, while an additional voltage source is introduced in the low current path to accommodate larger turn-on voltages of potential load devices. Another significant patent is the "High compliance laser driver." This device features two DC-coupled differential drive circuits, where the common mode voltage of the first circuit is maintained at a level that allows for a high compliance voltage for a laser diode driven by the second circuit. An operational amplifier plays a crucial role in this configuration, ensuring that the common mode voltage is adjusted to a desired value.
Career Highlights
Throughout his career, John J Stronczer has worked with various companies, including Applied Micro Circuits Corporation. His experience in these organizations has contributed to his expertise in developing innovative technologies.
Collaborations
John has collaborated with notable individuals in his field, including Todd M Tanji and Prashant K Singh. These partnerships have likely enhanced his work and led to further advancements in his inventions.
Conclusion
John J Stronczer's contributions to technology through his patents and collaborations highlight his innovative spirit and dedication to improving device performance. His work continues to influence the field and inspire future advancements.