John J Fitch

Title: John J Fitch: Innovator in Holographic Technology

Introduction

John J Fitch is a notable inventor based in Natick, MA (US), recognized for his contributions to the field of holographic technology. With a total of 7 patents, Fitch has made significant advancements in enhancing the visibility of diffraction patterns on transparent media.

Latest Patents

Fitch's latest patents focus on methods for enhancing the visibility of and imparting a metallic luster to holographic and diffraction pattern surface embossments on transparent media, such as plastic films. These methods utilize various techniques, including metallic effect dyes, metal flake inks with minimal resinous binders, inks containing crystalline pigments with metallic visual effects, and inks formed of optical stacks. It is crucial that the solvent used during the application of the dye or ink does not react with the embossed surface.

Career Highlights

Throughout his career, John J Fitch has worked with prominent companies, including Van Leer Metallized Products and Avery Dennison Corporation. His work has significantly impacted the development of innovative products in the holographic technology sector.

Collaborations

Fitch has collaborated with notable individuals in his field, including Richard G Miekka and Richard A Fotland. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

John J Fitch's work in holographic technology showcases his inventive spirit and dedication to enhancing visual effects in transparent media. His contributions continue to influence the industry and inspire future innovations.