Concord, MA, United States of America

John J Carrona


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 1983-1987

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2 patents (USPTO):Explore Patents

Title: John J Carrona: Innovator in Electron-Optical Technology

Introduction

John J Carrona is a notable inventor based in Concord, MA (US). He has made significant contributions to the field of electron-optical technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of charged particle beam writing systems.

Latest Patents

Carrona's latest patents include the "Modular all-electrostatic electron-optical column and assembly of said." This invention provides a modular-building block method and system for the fabrication, installation, alignment, and operation of a multi-beam assembly of miniaturized, all-electrostatic charged particle optical columns. These columns are designed to be mounted in parallel within a closely packed cluster over a small target surface area. This configuration allows for parallel simultaneous charged particle beam writing on the target surface, significantly increasing throughput during the fabrication of semiconductor micro-circuit chips. Another notable aspect of his work is the "Electron beam array alignment means," which includes a lens and deflector array mounting and alignment system composed of several parallel plates held in alignment by cylindrical spacer rods.

Career Highlights

Carrona has worked at Control Data Corporation, where he has been instrumental in advancing electron-optical technologies. His innovative approaches have contributed to the development of systems that enhance the performance of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include David M Walker and Alan P Sliski, who have collaborated with him on various projects within the field.

Conclusion

John J Carrona's contributions to electron-optical technology have paved the way for advancements in semiconductor manufacturing. His innovative patents reflect a commitment to improving the efficiency of charged particle beam writing systems.

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