Location History:
- Linden, MI (US) (2019)
- Atlanta, GA (US) (2022)
Company Filing History:
Years Active: 2019-2022
Title: Inventor Spotlight: John H. Taphouse
Introduction
John H. Taphouse, an innovative inventor based in Atlanta, GA, has made significant contributions to the field of materials science, particularly focusing on carbon nanotube (CNT) technologies. With a portfolio of two patents, Taphouse is recognized for his groundbreaking work that aims to enhance thermal interface materials, positioning him as a notable figure in his research community.
Latest Patents
One of Taphouse's latest patents involves methods for reducing thermal resistance of carbon nanotube arrays or sheets. His research demonstrates that CNT forests or sheets can be effectively coated and bonded at room temperature with one or more coatings. As a result, the thermal resistances achieved are comparable to traditional metallic solders. His innovative approach addresses the high contact resistance at CNT tips and/or sidewalls, a significant barrier in developing high-performance thermal interface materials. Impressively, Taphouse's methods resulted in resistances as low as 4.9±0.3 mm-K/W for the complete polymer-coated CNT interface structure.
Career Highlights
John H. Taphouse is affiliated with the Georgia Tech Research Corporation, where he leverages his expertise to further explore and enhance material properties. His contributions have been pivotal for advancements in applications that require high thermal conductivity and efficiency.
Collaborations
Throughout his career, Taphouse has collaborated with esteemed colleagues, including Baratunde A. Cola and Virendra Singh. These partnerships have been instrumental in driving forward innovative research that tackles complex challenges in material science.
Conclusion
John H. Taphouse stands out as a prominent inventor whose work in carbon nanotube technology has the potential to revolutionize thermal interface materials. As he continues to innovate in his field, his contributions serve as an inspiration for future developments in materials science.