Newark, DE, United States of America

John G Van Remoortel


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 28(Granted Patents)


Location History:

  • Wilmington, DE (US) (1979)
  • Newark, DE (US) (1991 - 1998)

Company Filing History:


Years Active: 1979-1998

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8 patents (USPTO):Explore Patents

Title: The Innovations of John G Van Remoortel

Introduction

John G Van Remoortel is a notable inventor based in Newark, Delaware. He has made significant contributions to the field of photosensitive material processing, holding a total of eight patents. His work has advanced the technology used in the development of photosensitive materials, showcasing his expertise and innovative spirit.

Latest Patents

Among his latest patents is a method and apparatus for processing photosensitive material. This invention involves an apparatus designed to wash a web or sheet of photosensitive material during the development process. The washing is accomplished by passing the material through a series of stations where it is sprayed, rather than immersed in a wash bath. This innovative approach ensures that the washed material consistently meets archival quality standards.

Career Highlights

John G Van Remoortel is currently employed at E.I. DuPont De Nemours and Company, where he continues to develop and refine his inventions. His career has been marked by a commitment to improving processes related to photosensitive materials, making him a valuable asset to his organization.

Collaborations

Throughout his career, John has collaborated with notable coworkers such as Joel L Vanover and Jon F Boyer. These partnerships have likely contributed to the success of his projects and the advancement of technology in their field.

Conclusion

John G Van Remoortel's contributions to the field of photosensitive material processing are significant and impactful. His innovative patents and dedication to his work at E.I. DuPont De Nemours and Company highlight his role as a leading inventor in this specialized area.

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