John G Harpold

Title: John G. Harpold: Innovator in Plasma Technology

Introduction

John G. Harpold is a notable inventor based in Bellvue, Colorado, recognized for his contributions to the field of plasma technology. With a total of four patents credited to his name, Harpold's innovations reflect a deep understanding of electrical systems and their applications in various technologies.

Latest Patents

Harpold's recent patents include a groundbreaking system for plasma ignition by fast voltage rise, which significantly enhances the efficiency of plasma initiation. This system leverages a rapid increase in voltage to stimulate pre-existing ions into creating secondary electron emissions. The intricacies of this invention allow for precise timing that aligns with the transit time of electrons across the plasma, achieving a voltage rise in less than 1000 microseconds. Such advancements maximize the emission of secondary electrons, with controlled transition times that can lead to a variety of collision energies ranging from 5 to 500 electron volts.

Another significant patent by Harpold pertains to an apparatus for the removal of electrical shorts in a sputtering system. This invention addresses the challenges of electrical shorts caused by flakes in thin film sputtering operations. The innovative removal techniques involve manipulating the power supply, utilizing over-current duration timing for sensing the flake, and transitioning power modes to progressively increase current and melt the obstruction. The circuitry is designed to adapt easily to sophisticated high-frequency DC power supplies, enhancing the operational reliability of sputtering systems.

Career Highlights

Throughout his career, Harpold has contributed to advanced technologies while working at Advanced Energy Industries, Inc. His expertise in the industry has allowed him to develop innovative solutions that address complex electrical engineering challenges.

Collaborations

John G. Harpold has collaborated with fellow engineers Jerry D. Siefkes and Douglas S. Schatz. Together, they have advanced the state of plasma technology and contributed to the development of innovations that enhance industrial processes.

Conclusion

John G. Harpold stands out as a significant figure in the realm of plasma technology. His patents reflect a commitment to innovation and problem-solving in electrical systems, paving the way for future advancements in the industry.