Company Filing History:
Years Active: 2005
Title: John F Thompson: Innovator in Chemical Mechanical Polishing Technology
Introduction
John F Thompson is a notable inventor based in Orlando, FL (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative work has led to the development of a unique CMP pad design that enhances the efficiency of the polishing process.
Latest Patents
Thompson holds a patent for a chemical mechanical polishing pad with grooves alternating between a larger groove size and a smaller groove size. This CMP pad features a groove pattern on its polishing surface, which consists of an alternating sequence of spaced apart grooves. The design incorporates grooves of two different sizes, improving the effectiveness of the polishing process.
Career Highlights
Thompson is associated with Agere Systems Inc., where he has applied his expertise in developing advanced polishing technologies. His work has been instrumental in enhancing the performance of CMP pads, which are crucial in semiconductor manufacturing.
Collaborations
Thompson has collaborated with notable colleagues, including Jose Omar Rodriguez and Charles A Storey. These partnerships have contributed to the advancement of CMP technology and the successful implementation of innovative solutions in the industry.
Conclusion
John F Thompson's contributions to chemical mechanical polishing technology exemplify his commitment to innovation. His patent and work at Agere Systems Inc. highlight his role as a key player in the field.