Company Filing History:
3 out of 2,714 
2 out of 3,345 
1 out of 745 Years Active: 1976-1993
Title: The Innovations of John D. Cuthbert
Introduction
John D. Cuthbert is a notable inventor based in Bethlehem, PA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work has had a lasting impact on the development of integrated circuits and semiconductor devices.
Latest Patents
Cuthbert's latest patents include an innovative integrated circuit process using a 'hard mask'. This process utilizes a layer of spin-on-glass as a hard mask for patterning an underlying layer of polysilicon. The patterned polysilicon is essential for the gate structures of field effect transistors. Another notable patent involves semiconductor device fabrication, which describes a non-destructive double exposure method for examining photoresist features in section, using techniques such as scanning electron microscopy.
Career Highlights
Throughout his career, Cuthbert has worked with prestigious organizations, including Bell Telephone Laboratories and AT&T Bell Laboratories. His experience in these companies has allowed him to develop groundbreaking technologies that have advanced the semiconductor industry.
Collaborations
Cuthbert has collaborated with several talented individuals in his field, including David Farnham Munro and Nicholas A. Soos. These collaborations have contributed to the success of his innovative projects.
Conclusion
John D. Cuthbert's contributions to semiconductor technology and his impressive portfolio of patents highlight his role as a significant inventor in the industry. His work continues to influence advancements in integrated circuits and semiconductor devices.