Landenberg, PA, United States of America

John D Bolt


Average Co-Inventor Count = 1.9

ph-index = 10

Forward Citations = 435(Granted Patents)


Location History:

  • Landenbert, PA (US) (1998)
  • Landenberg, PA (US) (1987 - 1999)
  • Mcewen, TN (US) (2008 - 2013)
  • Kingston, TN (US) (2014 - 2022)

Company Filing History:


Years Active: 1987-2022

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24 patents (USPTO):Explore Patents

Title: Innovations and Contributions of John D. Bolt in Titanium Dioxide Technology

Introduction: John D. Bolt is a prominent inventor based in Landenberg, PA, with a remarkable portfolio consisting of 24 patents. His work primarily focuses on advancements in materials science, particularly the preparation and application of titanium dioxide particles in photodurable thin film production.

Latest Patents: Among his latest innovations are two patents that detail the preparation of lacing resistant titanium dioxide particles. These processes involve dewatering titanium dioxide particles encapsulated with a layer of amorphous alumina, executed continuously at temperatures exceeding 100°C. Such innovations have significant implications for the durability and performance of thin films in various applications.

Career Highlights: Throughout his career, John has worked with notable companies in the chemical and materials sectors. He has contributed to E.I. du Pont de Nemours and Company, as well as The Chemours Company FC, LLC. His extensive experience in these reputable organizations has allowed him to refine his expertise and focus on cutting-edge innovations in his field.

Collaborations: John D. Bolt has collaborated with distinguished professionals such as Frederick N. Tebbe and Peter Jernakoff. These collaborations have fostered an environment of creativity and innovation, propelling advancements in the technologies related to titanium dioxide.

Conclusion: With his extensive patent portfolio and contributions to the field of materials science, John D. Bolt continues to be a vital figure in the development of durable materials for photodurable thin film applications. His advancements not only enhance the material performance but also pave the way for future innovations in this ever-evolving industry.

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