Company Filing History:
Years Active: 2002-2003
Title: The Ingenious Innovations of John Chao
Introduction
John Chao is an accomplished inventor based in San Jose, California, known for his significant contributions to substrate processing technology. With a total of two patents to his name, he has made notable advancements in methods that improve manufacturing processes in the semiconductor industry.
Latest Patents
Chao's latest patents showcase his expertise and innovative approach. The first patent, titled "Method for Rounding Corners and Removing Damaged Outer Surfaces of a Trench," details a process for modifying the contour of a trench formed on a substrate within a specialized processing chamber. This method involves using a coil and a plasma generation system, which applies RF energy to expose the substrate to a sputtering agent, effectively refining its surface.
His second notable patent, "Metal Mask Etching of Silicon," elaborates a sophisticated technique for etching trenches and contact vias. This method enables precise control over the etch profile, utilizing a metal-comprising masking material and a fluorine-comprising plasma etchant. This approach ensures minimal harm to the substrate while achieving the desired etching results, demonstrating Chao's commitment to enhancing semiconductor fabrication techniques.
Career Highlights
Chao is currently employed at Applied Materials, Inc., a prominent company in the field of semiconductor equipment and services. His role allows him to collaborate with cutting-edge technology and contribute to innovations that will shape the future of electronics.
Collaborations
Throughout his career, John Chao has partnered with talented coworkers, including Ajay Kumar and Anisul Haque Khan. Together, they have worked on various projects that further advance substrate processing techniques and improve manufacturing efficiency.
Conclusion
John Chao's contributions to the field of semiconductor manufacturing demonstrate his remarkable ingenuity and dedication as an inventor. His patented methods reflect a deep understanding of the complexities involved in substrate processing, marking him as a significant figure in the industry. With continued collaborations and innovations, Chao is set to inspire future technological advancements in his field.