Company Filing History:
Years Active: 1997
Title: The Innovative Contributions of John C. Pagano
Introduction
John C. Pagano is a notable inventor based in Totowa, NJ (US), recognized for his significant contributions to the field of technology. He holds a patent for a unique wafer grinding machine that enhances the efficiency of semiconductor manufacturing processes. His work exemplifies the intersection of innovation and practical application in the tech industry.
Latest Patents
John C. Pagano's most recent patent is for a wafer grinding machine. This innovative device utilizes a centrally located robot to transport a wafer from an input station to a measuring station. Following this, the wafer is sequentially moved into a grind station and a wash station. The robot's design allows it to transfer a wafer from the wash station either back to the measuring station for after-grinding measurements or directly to an output station. Notably, while one wafer is being ground, a second wafer can be held between the measuring station and the grind station, allowing for continuous operation and efficiency.
Career Highlights
Pagano is currently employed at Silicon Technology Corporation, where he applies his expertise in developing advanced manufacturing solutions. His role at the company has allowed him to focus on innovations that streamline production processes and improve product quality. His dedication to his work has made him a valuable asset to his team and the industry.
Collaborations
John C. Pagano collaborates with Thomas E. Leonard, a fellow innovator in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements and achieving common goals.
Conclusion
John C. Pagano's contributions to the field of technology, particularly through his patented wafer grinding machine, highlight his innovative spirit and commitment to enhancing manufacturing processes. His work continues to influence the semiconductor industry, showcasing the impact of dedicated inventors on technological progress.