Johannes T Schrama

Title: Innovations of Johannes T Schrama

Introduction

Johannes T Schrama is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of semiconductor devices and photolithography. With a total of 2 patents, his work reflects a commitment to advancing technology.

Latest Patents

One of his latest patents is a method of providing a patterned relief of cured photoresist on a flat surface. This method involves applying a UV-curable acrylate lacquer to a glass substrate and using a transparent mold to replicate a relief pattern. The process allows for the seamless creation of small dimensions on a large flat surface, overcoming challenges posed by large release forces. Another patent focuses on a controllable impedance attenuator that features two PIN-diodes arranged in series. This semiconductor device is designed for high-frequency applications and is suitable for integration into circuits.

Career Highlights

Johannes T Schrama has worked with U.S. Philips Corporation, where he has been able to apply his innovative ideas in practical applications. His expertise in semiconductor technology has positioned him as a valuable asset in the industry.

Collaborations

He has collaborated with notable coworkers such as Jan Haisma and Martinus Verheijen, contributing to various projects that enhance the capabilities of semiconductor devices.

Conclusion

Johannes T Schrama's contributions to technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to inspire advancements in semiconductor technology and photolithography.