Company Filing History:
Years Active: 2014
Title: Inventor Spotlight: Johannes Krijne
Introduction
Johannes Krijne, an innovative inventor based in PH Best, Netherlands, has made significant contributions to the field of material deposition technologies. With a keen focus on enhancing the efficiency of substrate handling processes, he holds a patent that demonstrates his expertise and creativity in this domain.
Latest Patents
Krijne's notable invention is titled "Arrangement for holding a substrate in a material deposition apparatus." This patent introduces a sophisticated arrangement that optimizes substrate handling in material deposition systems. The design consists of a shadow mask equipped with multiple deposition openings and a support structure that integrates surround openings, ensuring that the shadow mask is effectively positioned between the substrate and the support structure. This innovative setup facilitates precise material deposition on the substrate's designated side, enhancing the overall performance of material deposition apparatuses.
Career Highlights
Currently, Johannes Krijne is employed at Osram Opto Semiconductors GmbH, a company renowned for its advancements in optoelectronic systems. His work at Osram has allowed him to collaborate with leading experts in the field and contribute to cutting-edge technologies that impact various industries.
Collaborations
Throughout his career, Krijne has worked alongside talented individuals such as Erwin Eiling and Karl-Heinz Hohaus. These collaborations highlight his active engagement with other professionals, fostering an environment of innovation and collective problem-solving.
Conclusion
Johannes Krijne exemplifies the spirit of invention through his work in material deposition technologies. With his patent showcasing inventive arrangements for substrate handling, he continues to influence advancements in the field. As part of Osram Opto Semiconductors GmbH, Krijne's passion and expertise will undoubtedly lead to further innovations in the future.