Joern-Holger Franke

Title: Joern-Holger Franke: Innovator in Extreme Ultraviolet Lithography

Introduction

Joern-Holger Franke is a notable inventor based in Auderghem, Belgium. He has made significant contributions to the field of extreme ultraviolet lithography, with a total of two patents to his name. His work focuses on advancing lithography technology, which is crucial for the semiconductor manufacturing process.

Latest Patents

Franke's latest patents include an extreme ultraviolet lithography device and a lithography scanner. The extreme ultraviolet lithography device features a reticle with a lithographic pattern, a light-transmissive pellicle membrane, and an EUV illumination system designed to illuminate the reticle. This innovative device captures both scattered and non-scattered light, enhancing the imaging process. The lithography scanner patent describes a system that emits EUV light, utilizes a pellicle with an EUV transmissive membrane, and includes an imaging system that projects reflected light onto a target wafer. This design optimizes the scattering pattern for improved lithographic accuracy.

Career Highlights

Throughout his career, Joern-Holger Franke has worked with prominent organizations such as Imec and Katholieke Universiteit Leuven (KU Leuven R&D). His experience in these institutions has allowed him to collaborate on cutting-edge research and development projects in the field of lithography.

Collaborations

Franke has collaborated with notable colleagues, including Emily Gallagher and Ivan Pollentier. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Joern-Holger Franke is a distinguished inventor whose work in extreme ultraviolet lithography has made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology in this critical field.