Company Filing History:
Years Active: 2006
Introduction
Joerg Mellmann, an inventive mind based in Williston, Vermont, has made significant contributions to the fields of dosing technology and photomask correction. With two patents to his name, his work embodies the intersection of precision engineering and innovative problem-solving.
Latest Patents
Mellmann's recent innovations include a **dosing device** and a **writing implement with a dosing device**. This dosing device is designed for the demand-dosing of liquids and features a primary container, a point of release, a main liquid channel, and a vented secondary container. One of its unique attributes is the ability to measure flow indirectly via the filling level in the secondary container, making it reliable under varying ambient conditions. This advancement promises to enhance the functionality of electronic writing instruments.
His second patent involves a **system and method for correcting mask rule violations** after optical proximity correction. This method addresses rule-violating areas within a digital representation of a photomask. By identifying and manipulating these areas that violate minimum width and spacing rules, this technique improves the production and reliability of photomasks used in lithography processes.
Career Highlights
Joerg Mellmann has built a career working with notable companies in the technology sector, including Infineon Technologies AG and Gebr. Schmidt Fabrik Für Feinmechanik, GmbH & Co. KG. These experiences have equipped him with the expertise to innovate in both hardware development and precision manufacturing.
Collaborations
Throughout his career, Mellmann has had the opportunity to collaborate with skilled professionals such as Tilo Strobelt and Guenther Waibel. These partnerships have fostered an environment of creativity and shared knowledge, contributing to his inventive successes.
Conclusion
Joerg Mellmann stands out as an influential inventor whose patents are set to make waves in the realms of dosing technology and photomask correction. His dedication to innovation and collaboration continues to push the boundaries of what is possible in these technical fields. As advancements in technology proceed, Mellmann's contributions will undoubtedly play a vital role in shaping future developments.