Wuppertal, Germany

Joachim Hürten

This inventor holds 1 USPTO granted patent. Top assignee: Sympatex Technologies Gmbh. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joachim Hürten. Retrieved from https://idiyas.com/inventor/joachim-hürten

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Joachim Hürten: Innovator in Water-Resistant Materials

Introduction

Joachim Hürten is a notable inventor based in Wuppertal, Germany. He has made significant contributions to the field of materials science, particularly in developing innovative composite materials that enhance clothing functionality.

Latest Patents

Hürten holds a patent for a water-vapor-permeable, water-resistant composite material. This invention includes a functional layer that is both water-resistant and vapor-permeable, featuring a unique design with discrete polymer spots. The composite material is designed to be used in clothing, providing enhanced comfort and protection against the elements.

Career Highlights

Hürten is associated with Sympatex Technologies GmbH, a company known for its commitment to sustainable and high-performance textile solutions. His work focuses on creating advanced materials that meet the demands of modern clothing while ensuring environmental responsibility.

Collaborations

Hürten collaborates with Volker Schuster, contributing to the innovative projects at Sympatex Technologies GmbH. Their combined expertise in materials science drives the development of cutting-edge textile solutions.

Conclusion

Joachim Hürten's contributions to the field of water-resistant materials exemplify the intersection of innovation and functionality in clothing design. His work continues to influence the textile industry, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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