Company Filing History:
Years Active: 1998-1999
Title: Jo Woong Ha: Innovator in Platinum Thin-Film Technology
Introduction
Jo Woong Ha is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of methods for depositing platinum thin films on silicon wafers. With a total of 2 patents to his name, his work has implications for various technological applications.
Latest Patents
One of Jo Woong Ha's latest patents is a method for depositing a platinum layer on a silicon wafer. This innovative process involves several steps, including the deposition of a platinum layer on an insulating oxide layer under an oxidation atmosphere. This creates a mixture film consisting of platinum grains, platinum oxide grains, and oxygen. The method further includes depositing an additional platinum thin film to a desired thickness on the oxygen-containing platinum thin film under an inert atmosphere. Finally, the silicon substrate is annealed at temperatures ranging from 400 to 1,300 degrees Celsius to remove oxygen and stabilize the platinum thin film. This technique ensures that the silicon substrate does not have any glue layer between the platinum layer and the insulating layer.
Career Highlights
Throughout his career, Jo Woong Ha has worked with prominent companies in the cement industry, including Dong Yang Cement Corporation and Tong Yang Cement Corporation. His experience in these organizations has contributed to his expertise in materials and engineering.
Collaborations
Jo Woong Ha has collaborated with several professionals in his field, including Dong Su Lee and Dong Il Chun. These partnerships have likely enhanced his research and development efforts.
Conclusion
Jo Woong Ha's contributions to the field of platinum thin-film technology demonstrate his innovative spirit and commitment to advancing materials science. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.